- 레이저다이오드 | Laser Diode > VCSEL
High Power VCSEL Source for Industry
CW 100W to 9.6kW#
Beam angle (half) : typ. 10deg (95% power)#
•Tailored industrial heating and thermal processing#
•Plastics welding and forming#
•Manufacturing of composite parts#
•Metal heat treatment#
•Solar and semiconductor industry#
Philips Photonics’ infrared power systems offer attractive solutions in many application fields of industrial thermal processing. They deliver infrared output power of tens of watts up to tens of kilowatts onto a well-defined target area without complex beam shaping optics or scanning units. The energy density on the work piece ranges between traditional lasers and lamps/LEDs.
VCSEL arrays are an area source of intense and directed infrared radiation and can be used without additional optics for many area heating tasks. VCSEL heating modules come in a compact and robust housing with a protective window and are suited for easy machine integration in industrial applications and production processes.
The systems are based on modular building blocks of high power VCSEL arrays. The VCSEL emitters deliver 2 x 200W IR power in two emitter zones, where the IR power of each zone can be controlled independently. Simple and rugged modules in a compact form factor enable easy integration in a variety of production processes.
Philips Photonics offers a standard range of products for general industrial applications and specific application areas. Also custom made solutions are possible, tailored to specific process requirements.
Application domains are:
- Tailored industrial heating and thermal processing
- Plastics welding and forming
- Manufacturing of composite parts
- Woodworking machines
- Metal heat treatment
- Solar and semiconductor industry
Rectangular heating pattern
produced by 9.6 kW high
power VCSEL module
400W VCSEL emitter
Tailored Heating - Solar and Semiconductor Industry
Solar cell manufacturing
In solar cell manufacturing, a fast firing step is required for sintering of printed silver metallization lines on the solar cells. It has been demonstrated that this process can be realized by VCSEL heating with very good results. This may lead to improved process control and potentially lower production spread, new processing options, new compact machine concepts, energy saving and lower maintenance cost.
Successful VCSEL system integration in a fast firing line has been realized to test the feasibility and benchmark solar cell experiments have been done with encouraging results. An ultra-fast temperature rise (1050 K/s) was confirmed experimentally and the processed initial solar cells yielded already benchmark efficiency.
The principle can be used in other thick-film processes e.g. for passive components, passive electronic circuits and printed electronics.
Rapid thermal processing of Si-Wafers
VCSEL laser modules are powerful enough to realize rapid heating of large Si-wafers used in semiconductor manufacturing. For standard 300mm wafers, heating rates of 500 K/s or more are possible. At the same time, the local control of individual VCSEL emitters enables local control of the heating profile during processing, such that extremely good temperature homogeneity can be achieved.
Simulated intensity pattern on a 300 mm wafer with 50 kW total heating power.
Left: Arrangement of VCSEL emitters.
Right: Extremely homogeneous illumination at 300mm distance